Application of Bottlebrush Block Copolymers as Photonic Crystals

Rapid self-assembly of brush block copolymers to photonic crystals.

The reduced chain entanglement of brush polymers over their linear analogs drastically lowers the energetic barriers to reorganization. In this report, we demonstrate the rapid self-assembly of brush block copolymers to nanostructures with photonic bandgaps spanning the entire visible spectrum, from ultraviolet (UV) to near infrared (NIR). Linear relationships were observed between the peak wav...

Block Copolymers as Photonic Bandgap Materials

Block copolymers self-assemble into one-, two-, and three-dimensional periodic equilibrium structures, which can exhibit photonic bandgaps. This paper outlines a methodology for producing photonic crystals at optical length scales from block copolymers. Techniques for enhancing the intrinsic dielectric contrast between the block copolymer domains, as well as increasing the characteristic microd...

Thermally Tunable Metallodielectric Photonic Crystals from Self-assembly of Brush Block Copolymers and Gold Nanoparticles

Dr. D.-P. Song 1, C. Li 2, N. S. Colella 3, Prof. J. J. Watkins 6 Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, 01003, USA E-mail: [email protected] Prof. J.-H. Lee 5 Department of Mechanical and Industrial Engineering, University of Massachusetts Amherst, 160 Governors Drive, Amherst, MA 01003, USA Prof. X. Lu 4 School...

Utilization of Block Copolymers as Ultrafiltration Membranes

Application of new photolabile protecting groups as photocleavable joints of block copolymers.

New photoresponsive block copolymers (BCPs) have been developed by incorporating photocleavable units. These photocleavable units are derived from robust photolabile protecting groups (PPGs); UV irradiation cleaves the BCPs and releases a well-defined chemically active functional group at the cleaved end of a PS polymer.